TEL MB2-730 LP-CVD Low Pressure Chemical Vapor Deposition

Overview

The TEL MB2-730 is a Low Pressure Chemical Vapor Deposition (LP-CVD) system manufactured by Tokyo Electron Limited (TEL). It is designed for the deposition of high-quality thin films used in semiconductor manufacturing, research, and advanced process development. LP-CVD technology provides excellent film uniformity, repeatability, and conformal coverage for a variety of semiconductor applications.

Key Features

• Manufacturer: Tokyo Electron Limited (TEL)
• Model: MB2-730
• Equipment Type: Low Pressure Chemical Vapor Deposition (LP-CVD)
• Category: Chemical Vapor Deposition
• Condition: Used Semiconductor Equipment

Typical Applications

• Polysilicon thin-film deposition
• Silicon nitride (Si₃N₄) deposition
• Silicon dioxide (SiO₂) deposition
• Semiconductor wafer processing
• MEMS fabrication
• Process development and prototyping
• University cleanroom laboratories
• Pilot semiconductor fabrication facilities

Technology Advantages

• Low-pressure deposition process
• Excellent film thickness uniformity
• High-quality thin-film growth
• Reliable process repeatability
• Suitable for research and production environments

Equipment Information

Parameter	Specification
Manufacturer	Tokyo Electron Limited (TEL)
Model	MB2-730
Category	Low Pressure Chemical Vapor Deposition (LP-CVD)
Process Type	Chemical Vapor Deposition
Equipment Condition	Used

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Product image is for illustrative purposes only.

South Asia Semiconductor (SAS) provides semiconductor equipment sourcing services through international suppliers. Equipment specifications, availability, pricing, and final configuration are subject to confirmation by the supplier at the time of inquiry.